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Trench Sidewall Elimination Effect on Line-to-Line Leakage Current in Scalable Porous Silica ( k = 2.1)/Cu Interconnect Structure
Gawase, Akifumi, Chikaki, Shinichi, Nakamura, Naofumi, Soda, Eiichi, Oda, Noriaki, Saito, ShuichiVolume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.05FD02
Date:
May, 2010
File:
PDF, 1009 KB
english, 2010