Forty-Five Degree Micromirror Fabrication Using Silicon...

Japanese Journal of Applied Physics 2010 / 9 Vol. 49; Iss. 9

Forty-Five Degree Micromirror Fabrication Using Silicon Anisotropic Etching with Surfactant-Added Tetramethylammonium Hydroxide Solution

Yagyu, Hiroyuki, Yamaji, Tadahiro, Nishimura, Makoto, Sato, Kazuo
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.096503
Date:
September, 2010
File:
PDF, 252 KB
english, 2010
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