Dynamics of Radical Cation of Poly(styrene acrylate)-Based Chemically Amplified Resist for Extreme Ultraviolet and Electron Beam Lithography
Tajima, Yasuharu, Okamoto, Kazumasa, Kozawa, Takahiro, Tagawa, Seiichi, Fujiyoshi, Ryoko, Sumiyoshi, TakashiVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.06GD03
Date:
June, 2011
File:
PDF, 273 KB
english, 2011