Enhanced Degradation by Negative Bias Temperature Stress in...

Japanese Journal of Applied Physics 2012 / 2 Vol. 51; Iss. 2

Enhanced Degradation by Negative Bias Temperature Stress in Si Nanowire Transistor

Ota, Kensuke, Saitoh, Masumi, Tanaka, Chika, Nakabayashi, Yukio, Uchida, Ken, Numata, Toshinori
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Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.02BC08
Date:
February, 2012
File:
PDF, 608 KB
english, 2012
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