Effects of Light Exposure during Plasma Processing on...

Japanese Journal of Applied Physics 2013 / 01 Vol. 52; Iss. 1S

Effects of Light Exposure during Plasma Processing on Electrical Properties of GeO 2 /Ge Structures

Takeuchi, Kusumandari, Kato, Kimihiko, Shibayama, Shigehisa, Sakashita, Mitsuo, Taoka, Noriyuki, Nakatsuka, Osamu, Zaima, Shigeaki
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.01AC04
Date:
January, 2013
File:
PDF, 954 KB
english, 2013
Conversion to is in progress
Conversion to is failed