Fabrication of ramp-type junctions using a two angle ion beam etching process
Schoop, U, Schonecke, M, Schymon, S, Bauch, T, Marx, A, Wiedenhorst, B, Alff, L, Gross, RVolume:
12
Language:
english
Journal:
Superconductor Science and Technology
DOI:
10.1088/0953-2048/12/11/396
Date:
November, 1999
File:
PDF, 321 KB
english, 1999