Photo-Excited Etching of Poly-Crystalline and...

Japanese Journal of Applied Physics 1985 / 1 Vol. 24; Iss. Part 1, No

Photo-Excited Etching of Poly-Crystalline and Single-Crystalline Silicon in Cl 2 Atmosphere

Okano, Haruo, Horiike, Yasuhiro, Sekine, Makoto
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.24.68
Date:
January, 1985
File:
PDF, 1.51 MB
1985
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