Monolayer Halftone Phase-Shifting Mask for KrF Excimer...

Japanese Journal of Applied Physics 1993 / 12 Vol. 32; Iss. Part 1, No

Monolayer Halftone Phase-Shifting Mask for KrF Excimer Laser Lithography

Iwabuchi, Yohko, Ushioda, Jun, Tanabe, Hiroyoshi, Ogura, Yukio, Kishida, Shunji
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Volume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.5900
Date:
December, 1993
File:
PDF, 768 KB
1993
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