New Ultra-High-Frequency Plasma Source for Large-Scale...

Japanese Journal of Applied Physics 1995 / 12 Vol. 34; Iss. Part 1, No

New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes

Samukawa, Seiji, Nakagawa, Yukito, Tsukada, Tsutomu, Ueyama, Hiroyuki, Shinohara, Kibatsu
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Volume:
34
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.34.6805
Date:
December, 1995
File:
PDF, 813 KB
1995
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