Diffused Nitrogen-Related Deep Level in N-Type Silicon

Japanese Journal of Applied Physics 1996 / 4 Vol. 35; Iss. Part 1, No

Diffused Nitrogen-Related Deep Level in N-Type Silicon

Fuma, Naoki, Tashiro, Koichiro, Kakumoto, Katsunori, Takano, Yukio
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Volume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.35.1993
Date:
April, 1996
File:
PDF, 1004 KB
1996
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