Reaction Mechanism and Electrical Properties of ( B a , S r ) T i O 3 Films Prepared by Liquid Source Chemical Vapor Deposition
Yamamuka, Mikio, Kawahara, Takaaki, Yuuki, Akimasa, Ono, KouichiVolume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.35.2530
Date:
April, 1996
File:
PDF, 1.18 MB
1996