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In Situ X-Ray Diffractometry of Cristobalite Formation during High-Temperature Oxidation of SiC Films
Kingetsu, Toshiki, Ito, Kenjiro, Takehara, MasaharuVolume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.37.4160
Date:
July, 1998
File:
PDF, 416 KB
1998