Particle Removal and Its Mechanism on Hydrophobic Silicon...

Japanese Journal of Applied Physics 2001 / 11 Vol. 40; Iss. Part 1, No

Particle Removal and Its Mechanism on Hydrophobic Silicon Wafer in Highly Diluted NH 4 OH Solutions with an Added Surfactant

Park, Jin-Goo, Lee, Sang-Ho, Kim, Sang-Yong
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.40.6182
Date:
November, 2001
File:
PDF, 132 KB
english, 2001
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