Self-Diffusion in Extrinsic Silicon Using Isotopically...

Japanese Journal of Applied Physics 2001 / 3 Vol. 40; Iss. Part 2, No

Self-Diffusion in Extrinsic Silicon Using Isotopically Enriched 30Si Layer

Nakabayashi, Yukio, Osman, Hirman I., Segawa, Toru, Saito, Kazumasa, Matsumoto, Satoru, Murota, Junichi, Wada, Kazumi, Abe, Takao
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.40.l181
Date:
March, 2001
File:
PDF, 60 KB
english, 2001
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