Electrochemical Etching of 6H-SiC Using Aqueous KOH...

Japanese Journal of Applied Physics 2003 / 7 Vol. 42; Iss. Part 1, No

Electrochemical Etching of 6H-SiC Using Aqueous KOH Solutions with Low Surface Roughness

Kato, Masashi, Ichimura, Masaya, Arai, Eisuke, Ramasamy, Perumalsamy
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.42.4233
Date:
July, 2003
File:
PDF, 162 KB
english, 2003
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