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Study of Si Nanostructure in SiO 2 layer by Si + Implantation and Rapid Thermal Annealing
Lu, Fu-Fa, Lin, Tung-Hsien, Kao, Chin-HsingVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.43.4443
Date:
July, 2004
File:
PDF, 413 KB
english, 2004