Dependences of Process-Induced Damage on Imprint...

Japanese Journal of Applied Physics 2005 / 9 Vol. 44; Iss. 9B

Dependences of Process-Induced Damage on Imprint Characteristics in SrBi 2 Ta 2 O 9 Capacitors

Ashikaga, Kinya, Takaya, Koji, Kanehara, Takao, Koiwa, Ichiro
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.6938
Date:
September, 2005
File:
PDF, 206 KB
english, 2005
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