Impact of In situ...

Japanese Journal of Applied Physics 2007 / 5 Vol. 46; Iss. 5B

Impact of In situ Postnitridation Annealing for Successful Fabrication of HfSiON Thin Film

Horii, Sadayoshi, Ishikawa, Dai, Sano, Atsushi, Imai, Yoshinori, Kunii, Yasuo
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Volume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.46.3229
Date:
May, 2007
File:
PDF, 181 KB
english, 2007
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