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Electron Beam Lithography Simulation for the Patterning of Extreme Ultraviolet Masks
Tsikrikas, N., Patsis, G. P., Raptis, I., Gerardino, A., Quesnel, E.Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.47.4909
Date:
June, 2008
File:
PDF, 1.19 MB
english, 2008