HfO x N...

Japanese Journal of Applied Physics 2009 / 5 Vol. 48; Iss. 5

HfO x N y Thin-Film Formation on Three-Dimensional Si Structure Utilizing Electron Cyclotron Resonance Sputtering

Sano, Takahiro, Ohmi, Shun-ichiro
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.48.05db04
Date:
May, 2009
File:
PDF, 302 KB
english, 2009
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