Activation of As Atoms in Ultrashallow Junction during Milli- and Microsecond Annealing Induced by Thermal-Plasma-Jet Irradiation
Matsumoto, Kazuya, Ohta, Akio, Miyazaki, Seiichi, Higashi, SeiichiroVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.50.04da07
Date:
April, 2011
File:
PDF, 508 KB
english, 2011