Transient roughening behaviour and spontaneous pattern...

Transient roughening behaviour and spontaneous pattern formation during plasma etching of nanoporous silica

Kwon, Taesoon, Kan, Hung-Chih, Oehrlein, Gottlieb S, Phaneuf, Raymond J
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Volume:
18
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/18/5/055305
Date:
February, 2007
File:
PDF, 749 KB
english, 2007
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