Sputtering Yields of Si and Ni from the Ni...

Japanese Journal of Applied Physics 1982 / 1 Vol. 21; Iss. Part 1, No

Sputtering Yields of Si and Ni from the Ni 1- x Si x System Studied by Rutherford Backscattering Spectrometry

Kim, Su Chol, Yamaguchi, Satoru, Kataoka, Yoshihide, Iwami, Motohiro, Hiraki, Akio, Satou, Mamoru, Fujimoto, Fuminori
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Volume:
21
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.21.39
Date:
January, 1982
File:
PDF, 554 KB
1982
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