Study of Exposure Atmosphere Effect on PGMA Negative Resist...

Japanese Journal of Applied Physics 1985 / 6 Vol. 24; Iss. Part 1, No

Study of Exposure Atmosphere Effect on PGMA Negative Resist Cross-Linking in X-Ray Lithography Using 1–3 keV Soft X-Ray Sources

Okada, Koichi, Matsui, Junichi
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.772
Date:
June, 1985
File:
PDF, 681 KB
1985
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