High Rate and Low Temperature Deposition of Co-Cr Films by...

Japanese Journal of Applied Physics 1985 / 9 Vol. 24; Iss. Part 2, No

High Rate and Low Temperature Deposition of Co-Cr Films by Exposed Pole Magnetron Co-Sputtering System

Takahashi, Takakazu, Miyata, Tsutomu, Yoshida, Junsaku, Hata, Tomonobu
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L752
Date:
September, 1985
File:
PDF, 487 KB
1985
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