Hydrogen-Radical Annealing of Chemical Vapor-Deposited...

Japanese Journal of Applied Physics 1990 / 12 Vol. 29; Iss. Part 2, No

Hydrogen-Radical Annealing of Chemical Vapor-Deposited Amorphous Silicon Films

Uchida, Yasutaka, Kanoh, Hiroshi, Sugiura, Osamu, Matsumura, Masakiyo
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L2171
Date:
December, 1990
File:
PDF, 482 KB
1990
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