Characterization of µ c-Si:H Films Prepared by H...

Japanese Journal of Applied Physics 1990 / 3 Vol. 29; Iss. Part 2, No

Characterization of µ c-Si:H Films Prepared by H 2 Sputtering

Tonouchi, Masayoshi, Moriyama, Fuminori, Miyasato, Tatsuro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L385
Date:
March, 1990
File:
PDF, 642 KB
1990
Conversion to is in progress
Conversion to is failed