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Improvement in the Uniformity of Resistivity in a Magnetron-Sputtered Indium Tin Oxide Film by Controlling the Plasma Flux Distribution
Ichihara, Katsutaro, Okubo, MichikoVolume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.4478
Date:
July, 1994
File:
PDF, 520 KB
1994