$\bf TiO_{2}$ Thin Films Formed by Electron Cyclotron...

Japanese Journal of Applied Physics 1994 / 9 Vol. 33; Iss. Part 2, No

$\bf TiO_{2}$ Thin Films Formed by Electron Cyclotron Resonance Plasma Oxidation at High Temperature and Their Application to Capacitor Dielectrics

Abe, Yoshio, Fukuda, Takuya
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1248
Date:
September, 1994
File:
PDF, 564 KB
1994
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