Nitrogen Ion Implantation and Thermal Annealing in 6H–SiC Single Crystal
Miyajima, Takeshi, Tokura, Norihito, Fukumoto, Atsuo, Hayashi, Hidemitsu, Hara, KunihikoVolume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.1231
Date:
February, 1996
File:
PDF, 790 KB
1996