Characterization of F 2...

Japanese Journal of Applied Physics 1997 / 4 Vol. 36; Iss. Part 1, No

Characterization of F 2 Treatment Effects on Si(100) Surface and Si(100)/SiO 2 Interface

Kanashima, Takeshi, Kurioka, Yoshiaki, Imai, Takaaki, Yamamoto, Hideaki, Okuyama, Masanori
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.2460
Date:
April, 1997
File:
PDF, 637 KB
1997
Conversion to is in progress
Conversion to is failed