Etching Reactivity of Negative Ions Generated in Cl...

Japanese Journal of Applied Physics 2003 / 3 Vol. 42; Iss. Part 1, No

Etching Reactivity of Negative Ions Generated in Cl 2 Downstream Plasma

Morikawa, Yasuhiro, Shibayama, Toshikazu, Takayanagi, Satoshi, Ita, Hirotsugu, Shindo, Haruo, Ichiki, Takanori, Horiike, Yasuhiro
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.1435
Date:
March, 2003
File:
PDF, 200 KB
english, 2003
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