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Growth of 1-µm-thick Continuous β-FeSi 2 Films on Abraded p + -Si(001) Substrates by RF-Magnetron Sputtering
Momose, Noritaka, Hashimoto, Yoshio, Ito, KentaroVolume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.5490
Date:
September, 2003
File:
PDF, 285 KB
english, 2003