Effect of Atomic Hydrogen on Preparation of Highly...

Japanese Journal of Applied Physics 2004 / 11 Vol. 43; Iss. No. 12A

Effect of Atomic Hydrogen on Preparation of Highly Moisture-Resistive SiN x Films at Low Substrate Temperatures

Heya, Akira, Niki, Toshikazu, Takano, Masahiro, Yonezawa, Yasuto, Minamikawa, Toshiharu, Muroi, Susumu, Minami, Shigehira, Izumi, Akira, Masuda, Atsushi, Umemoto, Hironobu, Matsumura, Hideki
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Volume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.L1546
Date:
November, 2004
File:
PDF, 213 KB
english, 2004
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