![](/img/cover-not-exists.png)
Correlation between Residual Stress and Boron Concentration in Boron-Doped Silicon Films
Jeong, Ok Chan, Yang, Sang SikVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.350
Date:
January, 2005
File:
PDF, 325 KB
english, 2005