Correlation between Residual Stress and Boron Concentration...

Correlation between Residual Stress and Boron Concentration in Boron-Doped Silicon Films

Jeong, Ok Chan, Yang, Sang Sik
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.350
Date:
January, 2005
File:
PDF, 325 KB
english, 2005
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