Parametric Study on the Physical Action of Steam–Water...

Japanese Journal of Applied Physics 2012 / 5 Vol. 51

Parametric Study on the Physical Action of Steam–Water Mixture Jet: Removal of Photoresist Film from Silicon Wafer Surfaces

Mashiko, Takashi, Sanada, Toshiyuki, Nishiyama, Itsuo, Horibe, Hideo
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Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.067101
Date:
May, 2012
File:
PDF, 557 KB
english, 2012
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