Thermal chemistry of copper acetamidinate atomic layer deposition precursors on silicon oxide surfaces studied by XPS
Yao, Yunxi, Zaera, FranciscoVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4927843
Date:
January, 2016
File:
PDF, 3.25 MB
english, 2016