SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Characterization of line-edge roughness in photoresist using an image fading technique
Pawloski, Adam R., Acheta, Alden, Lalovic, Ivan, La Fontaine, Bruno M., Levinson, Harry J., Sturtevant, John L.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.537103
File:
PDF, 1.53 MB
english, 2004