SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness
George, Simi A., Naulleau, Patrick P., Gullikson, Eric M., Mochi, Iacopo, Salmassi, Farhad, Goldberg, Kenneth A., Anderson, Erik H., La Fontaine, Bruno M., Naulleau, Patrick P.Volume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.881524
File:
PDF, 376 KB
english, 2011