Cleaning Process for Using Chlorine Trifluoride Gas Silicon Carbide Chemical Vapor Deposition Reactor
Habuka, Hitoshi, Fukumoto, Yusuke, Mizuno, Kosuke, Ishida, Yuuki, Ohno, ToshiyukiVolume:
821-823
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.821-823.125
Date:
June, 2015
File:
PDF, 2.13 MB
english, 2015