Etching, smoothing, and deposition with gas-cluster ion...

Etching, smoothing, and deposition with gas-cluster ion beam technology

J.A Greer, D.B Fenner, J Hautala, L.P Allen, V DiFilippo, N Toyoda, I Yamada, J Matsuo, E Minami, H Katsumata
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Volume:
133-134
Year:
2000
Language:
english
Pages:
10
DOI:
10.1016/s0257-8972(00)00876-8
File:
PDF, 1.31 MB
english, 2000
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