![](/img/cover-not-exists.png)
Etching, smoothing, and deposition with gas-cluster ion beam technology
J.A Greer, D.B Fenner, J Hautala, L.P Allen, V DiFilippo, N Toyoda, I Yamada, J Matsuo, E Minami, H KatsumataVolume:
133-134
Year:
2000
Language:
english
Pages:
10
DOI:
10.1016/s0257-8972(00)00876-8
File:
PDF, 1.31 MB
english, 2000