Comparison of substrate temperature and deposition rate between modified pulsed arc process and d.c. arc process
B Engers, H Fuchs, J Schultz, E Hettkamp, H MeckeVolume:
133-134
Year:
2000
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(00)00885-9
File:
PDF, 378 KB
english, 2000