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Plasma-deposited hydrogenated carbon–germanium semiconducting films doped with acceptor and donor centers
J. Tyczkowski, P. Kazimierski, J. GrąbkowskiVolume:
142-144
Year:
2001
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(01)01256-7
File:
PDF, 126 KB
english, 2001