Diagnostic of a pulsed CH4–H2 plasma to improve microwave plasma assisted chemical vapour deposition process for diamond synthesis
L De Poucques, G Henrion, J Bougdira, R HugonVolume:
146-147
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0257-8972(01)01436-0
File:
PDF, 1.28 MB
english, 2001