Interface characterization of metal-HfO2-InAs gate stacks using hard x-ray photoemission spectroscopy
Persson, O., Lind, E., Lundgren, E., Rubio-Zuazo, J., Castro, G. R., Wernersson, L.-E., Mikkelsen, A., Timm, R.Volume:
3
Year:
2013
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.4817575
File:
PDF, 731 KB
english, 2013