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Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering
H Bartzsch, P Frach, K Goedicke, B Böcher, Chr GottfriedVolume:
150
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0257-8972(01)01507-9
File:
PDF, 178 KB
english, 2002