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Nanocrystal and nanocluster formation and oxidation in annealed Ge-implanted SiO2 films
E.S Marstein, A.E Gunnæs, U Serincan, R Turan, A Olsen, T.G FinstadVolume:
158-159
Year:
2002
Language:
english
Pages:
4
DOI:
10.1016/s0257-8972(02)00303-1
File:
PDF, 558 KB
english, 2002