Using Termination Effect to Characterize Electric and Magnetic Field Coupling Between TEM Cell and Microstrip Line
Shi, Chunlei, Fang, Wenxiao, Chai, Changchun, Huang, Yun, En, Yunfei, Yang, Yintang, Liu, Yuan, Chen, Yiqiang, Liao, XueyangYear:
2015
Language:
english
Journal:
IEEE Transactions on Electromagnetic Compatibility
DOI:
10.1109/TEMC.2015.2459063
File:
PDF, 1.05 MB
english, 2015