Etching characteristics of LiNbO3 crystal by fluorine gas...

Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Masashi Tamura, Shinzo Yoshikado
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Volume:
169-170
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(03)00070-7
File:
PDF, 513 KB
english, 2003
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