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Formation of titanium silicide thin films on Si(100) substrate by RF plasma CVD
O.A. Fouad, M. Yamazato, A. Hiroshi, M. Era, M. NaganoVolume:
169-170
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0257-8972(03)00078-1
File:
PDF, 839 KB
english, 2003